Reaction micro- and nano-imprint lithography with polymers.
Chan, Mary Bee Eng.
Date of Issue2004
School of Mechanical & Production Engineering
The objectives of the proposed Project are as follows: a) Development of High Aspect Ratio Micro- and Nano-Imprint Lithography for patterning over large surface areas. b) Development of soft-on-hard mold technology as an enabling technology for low pressure molding of high aspect ratio polymeric micro-structures and nano-structures. c) Development of ultrathin polymer film coating or grafting for release application. d) Development of novel release coating with good release and durability.
Nanyang Technological University