Novel system for direct writing of binary photomask using femtosecond laser
Date of Issue2004
School of Mechanical and Aerospace Engineering
Photomask is the backbone of semiconductor and other microfabrication industries. It is a high precision plate containing microscopic images of the miniaturized devices to be fabricated. A binary photomask is composed of transparent and opaque elements, which form one layer of a pattern. It is currently fabricated by the lithography process which is a complex process involving several steps and hence time consuming.
Nanyang Technological University