Characterisation of ZnO thin films produced by filtered cathodic vacuum arc technique
Tse, Kit Yan.
Date of Issue2004
School of Materials Science and Engineering
ZnO thin films were deposited on (100)Si substrates using filtered cathodic vacuum arc (FCVA) technique at various temperature (room temperature to 420 degree) and with different nitrogen to oxygen flow rate ratios (01. to 0.5) at 200 degree celsius.
DRNTU::Engineering::Materials::Photonics and optoelectronics materials
Nanyang Technological University