Characterisation and applications of chemically amplified photoresists for DUV microlithography.
Koh, Hui Peng.
Date of Issue2001
School of Materials Science and Engineering
This project aims to elucidate factors contributing to the pattern roughness for sub-180nm gate patterning from the aspects of material properties, nature of the aerial image quality and processing histories.
DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Nanoelectronics and interconnects
Nanyang Technological University