Optimization and comparison of argon plasma-induced quantum well intermixing using RIE and ICP.
Leong, Daniel Woon Loong.
Date of Issue2003
School of Electrical and Electronic Engineering
In this project, a novel quantum well intermixing (QWI) technique using inductively-coupled (ICP) and reactive-ion etcher (RIE) Argon plasma exposure has been developed.
DRNTU::Engineering::Electrical and electronic engineering::Optics, optoelectronics, photonics
Nanyang Technological University