Inductively coupled plasma chemical vapor deposition system for the synthesis of nanostructured thin films.
Lee, Yi Chau.
Date of Issue2004
School of Electrical and Electronic Engineering
In this work, we propose a custom-designed inductively coupled plasma chemical vapor deposition (ICP-CVD) system as an alternative manufacturing approach for nanostructured materials.
DRNTU::Engineering::Electrical and electronic engineering::Electric apparatus and materials
Nanyang Technological University