Impact of spike anneal on ultra shallow junction formation
Lai, Chung Woh
Date of Issue2002
School of Electrical and Electronic Engineering
This report explains the need for ultra shallow junctions for modern day CMOS devices, how spike anneal can help achieve this, reviews the important parameters if this process and how these parameters affect the performances of the CMOS transistors.
DRNTU::Engineering::Electrical and electronic engineering::Microelectronics
Nanyang Technological University