Application of phase shift masking to sub-0.13 micron lithography.
Koo, Chee Kiong.
Date of Issue2002
School of Electrical and Electronic Engineering
The main contribution of this thesis is to investigate the application of PSM, combined with other forms of RET, such as OAI and OPC, to poly gate patterning.
DRNTU::Engineering::Electrical and electronic engineering::Microelectronics
Nanyang Technological University