Preparation and characterization of amorphous SiCN films.
Date of Issue2001
School of Electrical and Electronic Engineering
In this project, a DC magnetron sputtering system with RF bias and a plasma enhanced electron cyclotron resonance chemical vapor deposition techniques have been successfully used to deposit a-SiCN films.
DRNTU::Engineering::Electrical and electronic engineering::Electric apparatus and materials
Nanyang Technological University