Characterization of hydrogenated amorphous and nanocrystalline silicon carbide deposited by ECR-CVD.
Date of Issue2001
School of Electrical and Electronic Engineering
In this project, the electron cyclotron resonance chemical vapor deposition (ECR-CVD) techique has been successfully used to deposit a-Sii-xCx:H and nc-SiC:H films.
DRNTU::Engineering::Electrical and electronic engineering::Electronic apparatus and materials
Nanyang Technological University