A study on ion implant uniformity.
Author
Chen, Xiao Song.
Date of Issue
2003School
School of Electrical and Electronic Engineering
Abstract
As a result of the recombination of electrons with the positive dopant ion species, neutral dopant atoms (no charge) are created during the process of ion being injected into wafer. Since the Faraday System (an instrument to measure Beam current) can only count charged atoms, the neutral dopant atoms are not counted resulting in an inaccurate dose measurement.
Subject
DRNTU::Engineering::Electrical and electronic engineering::Semiconductors
Type
Thesis
Rights
Nanyang Technological University
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