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      A study on ion implant uniformity.

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      EEE-THESES_171.pdf (2.685Mb)
      Author
      Chen, Xiao Song.
      Date of Issue
      2003
      School
      School of Electrical and Electronic Engineering
      Abstract
      As a result of the recombination of electrons with the positive dopant ion species, neutral dopant atoms (no charge) are created during the process of ion being injected into wafer. Since the Faraday System (an instrument to measure Beam current) can only count charged atoms, the neutral dopant atoms are not counted resulting in an inaccurate dose measurement.
      Subject
      DRNTU::Engineering::Electrical and electronic engineering::Semiconductors
      Type
      Thesis
      Rights
      Nanyang Technological University
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      • EEE Theses

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