Plasma radiation sources for X-ray lithography and neutron analysis applications
Wong, Terence Kin Shun
Lee, Paul Choon Keat
Springham, Stuart V.
Gribkov, Vladimir A.
Rajdeep Singh Rawat
Date of Issue1999
School of Electrical and Electronic Engineering
The main aim of this project was to develop soft x-ray point sources of sufficient power for application in SXR microelectronics lithography. The stated objective was to deliver l00-200W of SXR power, averaged over several minutes of burst duration, from a point source into 47~. The source was to be based on a plasma focus. The second aim of this project was to carry out a feasibility study of the use of plasma fusion neutrons for activation analysis applications.
DRNTU::Engineering::Electrical and electronic engineering::Microelectronics
Nanyang Technological University